Templating effect of single-layer graphene supported by an insulating substrate on the molecular orientation of lead phthalocyanine

• K. Priya Madhuri,
• Abhay A. Sagade,
• Pralay K. Santra and
• Neena S. John

Beilstein J. Nanotechnol. 2020, 11, 814–820, doi:10.3762/bjnano.11.66

• the triclinic polymorph exhibits intense NIR absorption bands [3][6]. The formation of specific crystalline phases of nonplanar MPc molecules has been largely explored by introducing various substrate modifications or templating layers including 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS), MoO3

A robust AFM-based method for locally measuring the elasticity of samples

• Alexandre Bubendorf,
• Stefan Walheim,
• Thomas Schimmel and
• Ernst Meyer

Beilstein J. Nanotechnol. 2018, 9, 1–10, doi:10.3762/bjnano.9.1

• -density polyethylene) and a self-assembled monolayer of 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) on a silicon oxide substrate perforated with circular holes prepared by polymer blend lithography. For all samples the relation was evidenced by recording Δf1, Δf2 and FN as a function of the Z

• elastic modulus from Δf22/Δf1. The method was used to give an estimate of the Young’s modulus of the FDTS thin film. Keywords: atomic force microscopy; contact resonances; elastic modulus; 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS); polymers; Young’s modulus; Introduction Knowledge of the local

• ) of 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) on a silicon oxide (SiOx) substrate were investigated. The SAM was prepared with circular holes obtained by polymer blend lithography (PBL) [24]. A reference sample consisting of polytetrafluoroethylene (PTFE), commonly called Teflon, with a nominal

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

• Cheng Huang,
• Markus Moosmann,
• Jiehong Jin,
• Tobias Heiler,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71

• inducing breath figures (evaporated condensed entity) at higher humidity during the spin-coating process. Here we demonstrate the formation of a lateral pattern consisting of regions covered with 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) and (3-aminopropyl)triethoxysilane (APTES), and at the same

• containing two droplets of 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS, Aldrich) and evacuated to a pressure of 50 mbar. The PS islands were later removed by snow-jet blasts. For sufficient impact it is important that the CO2 gas cylinder is at room temperature and has a proper filling level. The polymer

• -blend mask rinsed in acetic acid is shown (the image was taken with a tilted angle of around 45°). After this treatment only the PS islands remain on the silicon substrate. The PMMA layer (marked red in Figure 3a) has been completely removed. After the deposition of the 1H,1H,2H,2H